Hafnium t-butoxide, with the CAS number 2172-02-3, is an organometallic compound that features hafnium, a transition metal, bonded to t-butoxide groups. It typically appears as a colorless to pale yellow liquid and is known for its reactivity, particularly in the presence of moisture, which can lead to hydrolysis. This compound is often utilized in the field of materials science, particularly in the production of hafnium oxide thin films, which are important for applications in electronics and optics due to their high dielectric constant and thermal stability. Hafnium t-butoxide is also used as a precursor in chemical vapor deposition (CVD) processes. Its molecular structure includes hafnium coordinated to four t-butoxide ligands, which can influence its solubility and reactivity. Safety precautions are necessary when handling this compound, as it can be hazardous upon contact with skin or if inhaled. Proper storage in a cool, dry place away from moisture is essential to maintain its stability and integrity.

Hafnium t-butoxide

2172-02-3: Hafnium tert-butoxide, Hafnium(IV) t-butoxide (99.9%-Hf), Hafnium Tetrakis(2-Methylpropan-2-Olate)

Hafnium(IV) tert-butoxide

Hafnium(IV) t-butoxide (99.9%-Hf, <1.5%-Zr)

Hafnium t-butoxide, 99.9%

HAFNIUM TERT-BUTOXIDE

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CAS 2172-02-3: Hafnium t-butoxide

Hafnium(IV) tert-butoxide

Ref: 54-IN5372

Hafnium(IV) t-butoxide (99.9%-Hf, <1.5%-Zr)

Ref: 08-72-5800

Hafnium t-butoxide, 99.9%

Ref: 7W-GX8723

HAFNIUM TERT-BUTOXIDE

Ref: IN-DA003QTY

Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.5%

Ref: 02-041908