CAS 6074-84-6: Tantalum ethoxide

Tantalum(V) ethoxide, distilled

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Tantalum(V) ethoxide (99.9999%-Ta) PURATREM

Tantalum ethoxide is used as an exothermic reaction to produce coatings on materials. It is a compound of tantalum and ethoxide, which is an oxide of the element. Tantalum ethoxide has been shown to be effective as a coating material in electrochemical impedance spectroscopy for diagnostic agents. In cell culture, it has been used as a model system for the formation rate of boron nitride nanotubes. Tantalum ethoxide can be used to pattern surfaces with hydroxyl groups and iron oxides in a model system that mimics industrial processing.

ALD Material Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber. Tantalum(V) ethoxide; Pentaethoxytantalum; Tantalum(5+) ethanolate Soluble: toluene, ethanolVapor pressure, 20 °C: 8 mmVapor pressure, 50 °C: 26 mmMolecular complexity: 1.98Employed in sol-gel synthesis of bulk and thin film Ta2O5 as a capacitor dielectricEmployed in sol-gel synthesis of lithium tantalate ferroelectricsForms chiral complexes with substituted trialkanolamines useful in asymmetric catalysisEmployed in low-pressure CVD of optical interference filtersTavalite® jewelry in which alternating TaO5-SiO2 are deposited onto cubic zirconia

Tantalum(V) ethoxide

Tantalum(V) ethoxide (99.99+%-Ta) PURATREM

Tantalum(V) ethoxide acts as a precursor used in the preparation of ultra thin films of tantalum oxide and other tantalum containing films, which finds application in semiconductors. It is also used to prepare tantalum oxide nanoparticles for the imaging cartilage. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Tantalum(V) ethoxide acts as a precursor used in the preparation of ultra thin films of tantalum oxide and other tantalum containing films, which finds application in semiconductors. It is also used to prepare tantalum oxide nanoparticles for the imaging cartilage. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.