CAS 75-59-2: Tetramethylammonium hydroxide

Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Tetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, basic solvent in the development of acidic photoresist in photolithography process, as surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds application in the production of organic silicon, where it is used for computer silicon wafer surface brightener and cleaning agent. It is also involved in the purification of some metallic elements. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Applications Tetramethylammonium Hydroxide is used to prepare a new family of silicate/aluminosilicate mesoporous molecular sieves. Not a dangerous good if item is equal to or less than 1g/ml and there is less than 100g/ml in the package References Beck, J., et al.: J. Am. Chem. Soc., 114, 10834 (1992).

Tetramethylammonium hydroxide is a strong base that is used in analytical chemistry for the quantitative determination of zirconium. It is an analytical reagent and has a pH of 14. Tetramethylammonium hydroxide forms complexes with metals such as zirconium and titanium, which are then analyzed by various methods such as atomic absorption spectroscopy, x-ray fluorescence spectroscopy, and inductively coupled plasma mass spectrometry. The optimum concentration of tetramethylammonium hydroxide for this application is approximately 25%. Tetramethylammonium hydroxide reacts with p-nitrophenyl phosphate to form a pink product, which can be detected by colorimetric analysis. This reaction also produces hydrogen fluoride gas, which must be removed before the solution can be used again. Tetramethylammonium hydroxide reacts with ammonium to form tetramethylammonium ion and water. It also reacts

This Thermo Scientific Chemicals brand product was originally part of the Acros Organics product portfolio. Some documentation and label information may refer to the legacy brand. The original Acros Organics product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

This Thermo Scientific Chemicals brand product was originally part of the Acros Organics product portfolio. Some documentation and label information may refer to the legacy brand. The original Acros Organics product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Tetramethylammonium hydroxide is used for anisotropic etching of silicon. As a basic solvent, it is used in the development of acidic photoresist in the photolithography process. It acts as phase transfer catalyst and surfactant and is used in the synthesis of ferrofluid in order to inhibit nanoparticle aggregation. It finds application in thermochemolysis, an analytical technique involving both pyrolysis and chemical derivatization of the analyte. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.