Silanes

DMS-C15 - Carbinol (hydroxyl) terminated polydimethylsiloxane, 30-50 cSt

ALD Material Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber. Tris(dimethylamino)silane; Tris(dimethylamido)silylhydride; N,N,N',N',N'',N''-Hexamethylsilanetriamine AIR TRANSPORT FORBIDDENVapor pressure, 4 °C: 1 6 mmHydrosilylates olefins in presence of Rh2Cl2(CO)4Reacts with ammonia to form silicon nitride prepolymersEmployed in low pressure CVD of silicon nitride

Diamino Functional Trialkoxy Silane Silane coupling agents have the ability to form a durable bond between organic and inorganic materials to generate desired heterogeneous environments or to incorporate the bulk properties of different phases into a uniform composite structure. The general formula has two classes of functionality. The hydrolyzable group forms stable condensation products with siliceous surfaces and other oxides such as those of aluminum, zirconium, tin, titanium, and nickel. The organofunctional group alters the wetting or adhesion characteristics of the substrate, utilizes the substrate to catalyze chemical transformations at the heterogeneous interface, orders the interfacial region, or modifies its partition characteristics, and significantly effects the covalent bond between organic and inorganic materials. N-(2-Aminoethyl)-3-aminopropyltriethoxysilane; N-[3-(Triethoxysilyl)propyl]-1,2-ethanediamine; N-[3-(Triethoxysilyl)propyl]-ethylenediamine Primary amine with an internal secondary amine coupling agent for UV cure and epoxy systemsUsed in microparticle surface modificationSlower hydrolysis rate than SIA0591.0 and SIA0592.6

Trimethylsilyl Blocking Agent Used as a protecting group for reactive hydrogens in alcohols, amines, thiols, and carboxylic acids. Organosilanes are hydrogen-like, can be introduced in high yield, and can be removed under selective conditions. They are stable over a wide range of reaction conditions and can be removed in the presence of other functional groups, including other protecting groups. The tolerance of silylated alcohols to chemical transformations summary is presented in Table 1 of the Silicon-Based Blocking Agents brochure. Trimethylsilylimidazole; TMSIM; 1-(Trimethylsilyl)imidazole Powerful silylating agent for alcoholsDoes not react with aliphatic aminesNafion SAC-13 has been shown to be a recyclable catalyst for the trimethylsilylation of primary, secondary, and tertiary alcohols in excellent yields and short reaction timesSummary of selective deprotection conditions is provided in Table 7 through Table 20 of the Silicon-Based Blocking Agents brochure