CAS 10026-04-7: Silano, tetracloruro

ALD Material Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber. Tetrachlorosilane; Silicon chloride; Silicon tetrachloride Viscosity: 0.35 cStΔHform: -640 kJ/molΔHvap: 31.8 kJ/molΔHfus: 45.2 J/gSurface tension: 19.7 mN/mDielectric constant: 2.40Vapor pressure, 20 °C: 194 mmCritical pressure: 37.0 atmCritical temperature: 234 °CCoefficient of thermal expansion: 1.1 x 10-3Specific heat: 0.84 J/g/°Reaction with living alkali metal terminated polymers results in star polymersPrimary industrial use - combustion with hydrogen and air to give fumed silicaEnantioselectively opens stilbine epoxides to trichlorosilylated chlorohydrinsPromotes the reaction of aldehydes with isocyanides

Silicon(IV) chloride, fiber optic grade (99.9999%-Si, 50ppm-Fe) PURATREM, 98-0147, contained in a 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD

This Thermo Scientific Chemicals brand product was originally part of the Acros Organics product portfolio. Some documentation and label information may refer to the legacy brand. The original Acros Organics product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Silicon(IV) chloride, fiber optic grade (99.9999%-Si, 50ppm-Fe) PURATREM

Silicon(IV) chloride is used as an intermediate in the manufacture of polysilicon. It is also used in the semiconductors industry, photovoltaic cells and in the production of optical fibers. Its derivatives like trichlorosilane and silane are used in the Siemens process. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Silicon(IV) chloride is used as semiconductor grade. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Tetrachlorosilane is a reactive chemical that can be prepared by reacting hydrochloric acid with silicon. Tetrachlorosilane has been used in the past as a catalyst in the production of titanium metal and as an activator for hydrogenation reactions. Tetrachlorosilane is also commonly used to prepare hydrophobic gels, which are porous solids that are hydrophobic on their outside surfaces and hydrophilic on their inside surfaces. The pores of these gels can be filled with a liquid or gas, depending on the desired application. A plasma mass spectrometer (PMS) is an analytical instrument that ionizes gases by passing them through a high-voltage electric discharge in a vacuum. Hydrogen gas can be ionized by this process, so it can then be analyzed using various detection methods such as PMS to determine its composition and concentration.